Talk:Care

Page contents not supported in other languages.
From Wikipedia, the free encyclopedia
WikiProject iconDisambiguation
WikiProject iconThis disambiguation page is within the scope of WikiProject Disambiguation, an attempt to structure and organize all disambiguation pages on Wikipedia. If you wish to help, you can edit the page attached to this talk page, or visit the project page, where you can join the project or contribute to the discussion.

Confusing part[edit]

An anon tried to add this:

  1. care used for online IRC chat. meant as an insult

I don't know what it means? --Sadi Carnot 11:31, 18 April 2006 (UTC)[reply]

It just expresses in its ironic shortness, that you actually don't care. Valid entry for urbandictionary, but unnecessary here. 80.144.233.103 19:53, 26 July 2007 (UTC)[reply]

Love?[edit]

The verb 'care' has also been used to express affection, like love. As in 'I care for you deeply' or something. Both in a romantic and a family sense probably. It can be both an emotional verb or an action verb. Only its use in the sense of action is described in this article. Tyciol (talk) 20:11, 16 April 2008 (UTC)[reply]

Animal Care[edit]

As in "I cared for my flock"--Alchemist Jack (talk) 02:25, 13 September 2009 (UTC)[reply]

CARE (Catalyst-referred Etching)[edit]

A novel abrasive-free planarization method, which is termed catalyst-referred etching (CARE), has been developed in Yamauchi lab. In SiC CARE, Pt is used as a catalyst and HF solution is used as an etchant. Recently, chemical mechanical polishing (CMP) has been commonly used to planarize SiC surfaces to a root-mean-square (RMS) of less than 0.2 nm. To realize better surface roughness, we have developed a new planarization method called catalyst-referred etching (CARE) [1]. CARE can produce flat, undamaged, and alternating of wide and narrow terraces with an RMS roughness of less than 0.1 nm over a whole wafer [2, 3]. In SiC CARE, a platinum film, which acts as a catalyst, is rotated in contact with a SiC surface in HF solution. CMP uses an abrasive with a corrosive chemical slurry and a hard, extremely flat pad which are diffirent from the abrasive-free and soft rubber pad in CARE. The catalyst in CARE has a similar function to a polishing pad in CMP. Chemical etching occurs when the topmost SiC surface comes into contact with the catalyst plate in HF solution. The coexistence of HF solution and the Pt catalyst is critical for etching to occur.